Material and Process Development for KrF Lithography using Tri-level Resist Process.
نویسندگان
چکیده
منابع مشابه
Report on EUV resist and process limitations
EUV lithography (λ=13.4nm) has been identified as one of the technologies likely to succeed to 193nm lithography for the definition of ever-smaller transistor architectures. Whether EUV in the end will outrank competing technologies for the 32nm and 22nm nodes (Hyper NA immersion, maskless, nanoimprint) and whether EUV will make it to mass production of integrated circuits will depend on both E...
متن کاملNanometer-Scale Patterning on PMMA Resist by Force Microscopy Lithography
Nanoscale science and technology has today mainly focused on the fabrication of nano devices. In this paper, we study the use of lithography process to build the desired nanostructures directly. Nanolithography on polymethylmethacrylate (PMMA) surface is carried out by using Atomic Force Microscope (AFM) equipped with silicon tip, in contact mode. The analysis of the results shows that the ...
متن کاملNovel Resist Materials for next Generation Lithography
........................................................................................................................................................ ii Acknowledgments ....................................................................................................................................... iii Publications............................................................................
متن کاملMetallic resist for phase-change lithography
Currently, the most widely used photoresists in optical lithography are organic-based resists. The major limitations of such resists include the photon accumulation severely affects the quality of photolithography patterns and the size of the pattern is constrained by the diffraction limit. Phase-change lithography, which uses semiconductor-based resists such as chalcogenide Ge₂Sb₂Te₅ films, wa...
متن کاملThe Development Process for Courseware Material: A Computing Methodology Approach
At a university level, the conceptual stage of computerfacilitated learning (CFL) tends to be a faculty wide forum with ideas and inputs coming from many sources (e.g. academics, support staff, students). At the department level however, it is often a single academic who develops these ideas and attempts to satisfy the requirements. These requirements necessitate a full pedagogic understanding....
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2001
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.14.469